Open AccessAnnealing behaviour of electron-beam deposited tin dioxide films
Author(s) -
Arjeesh Gupta,
Poonam Gupta,
Vikas Srivastava
Publication year - 1984
Publication title -
bulletin of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.35
H-Index - 72
eISSN - 0973-7669
pISSN - 0250-4707
DOI - 10.1007/bf02743952
Subject(s) - electrical resistivity and conductivity , materials science , annealing (glass) , tin dioxide , electron beam physical vapor deposition , scanning electron microscope , tin , analytical chemistry (journal) , cathode ray , thin film , electron , composite material , metallurgy , nanotechnology , chemistry , physics , chromatography , quantum mechanics , electrical engineering , engineering
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