Open AccessDesigning of high-resolution photoresists: use of modern NMR techniques for evaluating lithographic performance
Author(s) -
Debmalya Roy,
P. K. Basu,
P. Raghunathan,
S. V. Eswaran
Publication year - 2004
Publication title -
bulletin of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.35
H-Index - 72
eISSN - 0973-7669
pISSN - 0250-4707
DOI - 10.1007/bf02708521
Subject(s) - photoresist , materials science , lithography , resist , monomer , nanotechnology , optoelectronics , polymer , composite material , layer (electronics)
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