Open AccessOxidation of copper and electronic transport in copper oxides
Author(s) -
J. H. Park,
K. Natesan
Publication year - 1993
Publication title -
oxidation of metals
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.654
H-Index - 74
eISSN - 1573-4889
pISSN - 0030-770X
DOI - 10.1007/bf00664664
Subject(s) - copper , oxygen , materials science , diffusion , analytical chemistry (journal) , grain boundary , partial pressure , enthalpy , atmospheric temperature range , electrical resistivity and conductivity , thermal conduction , conductivity , grain boundary diffusion coefficient , activation energy , inorganic chemistry , chemistry , metallurgy , thermodynamics , microstructure , physics , organic chemistry , chromatography , electrical engineering , composite material , engineering
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