Open AccessThe influence of surface kinetics in modelling chemical vapour deposition processes in porous preforms
Author(s) -
J.P. Dekker,
R. Moene,
J. Schoonman
Publication year - 1996
Publication title -
journal of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.813
H-Index - 177
eISSN - 1573-4803
pISSN - 0022-2461
DOI - 10.1007/bf00356018
Subject(s) - materials science , porosity , thiele modulus , chemical vapor infiltration , deposition (geology) , isothermal process , tin , porous medium , kinetics , composite material , chemical vapor deposition , diffusion , thermodynamics , nanotechnology , metallurgy , paleontology , physics , quantum mechanics , sediment , biology
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