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Numerical Simulation of Metalorganic Molecular Beam Epitaxy Growth over Structured Surfaces
Author(s) -
Menke C.,
Wachter M.
Publication year - 1998
Publication title -
zamm ‐ journal of applied mathematics and mechanics / zeitschrift für angewandte mathematik und mechanik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.449
H-Index - 51
eISSN - 1521-4001
pISSN - 0044-2267
DOI - 10.1002/zamm.19980781575
Subject(s) - molecular beam epitaxy , facet (psychology) , diffusion , surface diffusion , substrate (aquarium) , crystal (programming language) , epitaxy , crystal growth , materials science , desorption , orientation (vector space) , surface (topology) , metalorganic vapour phase epitaxy , adsorption , chemical physics , optics , crystallography , chemistry , nanotechnology , geometry , physics , layer (electronics) , thermodynamics , mathematics , oceanography , computer science , psychology , social psychology , big five personality traits , programming language , personality , geology
A mathematical model for the crystal growth over nonplanar substrates by metalorganic molecular beam epitaxy (MOMBE) is proposed. The substrate consists of crystal facets of various orientation, and of masks where no growth takes place. Surface diffusion, adsorption and desorption of atoms are taken into account. The surface diffusion processes between simultaneously growing facets are a function of the step density, which is preset by the substrate orientation. A nonlinear partial differential equation of first order in time and of fourth order in space is derived to describe the evolution of the crystal surface. Numerical simulations are presented which are in good agreement with measurements of InP crystals grown by MOMBE. In particular, experimentally observed small surface corrugations near facet edges can be explained by our model.