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Investigations on Chemical Vapour Deposition of Magnesium‐Boron‐Containing Metal‐Organic Precursors
Author(s) -
Mathur Sanjay,
Rügamer Thomas,
Braunschweig Holger,
D'Andola Giovanni
Publication year - 2007
Publication title -
zeitschrift für anorganische und allgemeine chemie
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.354
H-Index - 66
eISSN - 1521-3749
pISSN - 0044-2313
DOI - 10.1002/zaac.200700368
Subject(s) - boron , x ray photoelectron spectroscopy , chemical vapor deposition , magnesium , materials science , deposition (geology) , metal , chemical composition , thin film , carbon fibers , analytical chemistry (journal) , inorganic chemistry , chemical engineering , chemistry , metallurgy , nanotechnology , environmental chemistry , organic chemistry , sediment , composite number , engineering , composite material , biology , paleontology
Abstract Single‐molecular magnesium‐boron precursors [Mg(C 3 H 6 ‐BC 8 H 14 ) 2 ] and [Mg{C 3 H 6 ‐B(C 6 H 11 ) 2 } 2 ] were applied in chemical vapour deposition processes and characterized using SEM, XRD, XPS, AFM and MS methods towards their fragmentation behaviour, film morphology, phase formation and film composition. Depositon procedures in a temperature range from 500 to 1000 °C produced smooth and thin films with Mg and B in the ration 1:2. It could be shown that the contamination of the deposits by a considerably fraction of residual carbon could be reduced by post‐deposition in‐situ tempering or additionally sputter processes which may lead to improved deposition of MgB 2 ‐films.