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Acid‐Base Properties of Xenon Di‐ and Tetrafluoride in High Temperature Reactions
Author(s) -
Kiselev Yu. M.,
Fadeeva N. E.,
Popov A. I.,
Spitzin V. I.
Publication year - 1988
Publication title -
zeitschrift für anorganische und allgemeine chemie
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.354
H-Index - 66
eISSN - 1521-3749
pISSN - 0044-2313
DOI - 10.1002/zaac.19885590121
Subject(s) - tetrafluoride , xenon , chemistry , reagent , base (topology) , fluorine , lewis acids and bases , inorganic chemistry , organic chemistry , analytical chemistry (journal) , catalysis , mathematical analysis , mathematics
Reaction of xenon di‐ and tetrafluoride with different transition element fluorocomplexes at high temperatures has been studied. The formation of Xe IV anionic complexes M 2 XeF 6 has been found. XeF 4 is shown to reveal two kinds of properties: oxidative (higher than 300°C) and acidic (between 150‐300°C), independently whether it was initially introduced into the system or arised in it from XeF 2 . The reaction path of xenon tetrafluoride is shown to depend upon the other reagent properties. The conclusion is made that Lewis acidic properties of xenon fluorides decrease as follows: XeF 6 ≈ XeF 4 ≫ XeF 2 .
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