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Investigation of the interaction of precipitating nickel (II) hydroxide with silica surfaces by rutherford back scattering (RBS)
Author(s) -
De Roos G.,
Fluit J. M.,
Hermans L. A. M.,
Geus J. W.
Publication year - 1979
Publication title -
zeitschrift für anorganische und allgemeine chemie
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.354
H-Index - 66
eISSN - 1521-3749
pISSN - 0044-2313
DOI - 10.1002/zaac.19794490112
Subject(s) - quartz , scanning electron microscope , nickel , hydroxide , scattering , layer (electronics) , ion , materials science , surface layer , analytical chemistry (journal) , chemistry , crystallography , mineralogy , inorganic chemistry , composite material , metallurgy , optics , chromatography , physics , organic chemistry
Rutherford Back Scattering (RBS) has been applied in combination with Scanning Electron Microscopy (SEM) to investigate the interaction of precipitatig nickelhydroxide with quartz surfaces. It was found that hydroxylation of the quartz surface is a prerequisite for the formation of a weakly adhering nickelhydrosilicate layer. On a fire‐polished quartz surface no reaction with the quartz took place, a very weakly adhering nickelhydroxide layer being deposited. When the nickelhydroxide was precipitated in the presence of finely divided suspended silica, the precipitating nickel ions appeared to react preferently with the small reactive silica particals. It is shown that these results agree well with literature data. RBS together with SEM appeared to be a powerfull technique for studying these surface reactions.