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The behaviour of microquantities of sulphur heated in vacuum in silica tubes
Author(s) -
Todorovsky D. S.,
Tomov A. K.,
Kostadinov K. N.
Publication year - 1978
Publication title -
zeitschrift für anorganische und allgemeine chemie
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.354
H-Index - 66
eISSN - 1521-3749
pISSN - 0044-2313
DOI - 10.1002/zaac.19784470128
Subject(s) - adsorption , torr , outgassing , layer (electronics) , tube (container) , water vapor , sulfur , materials science , ultra high vacuum , chemical engineering , chemistry , composite material , metallurgy , nanotechnology , organic chemistry , thermodynamics , physics , engineering
The investigation have been made on the reasons for chemical changes of 35 S during heating (570°C, 50 h) in vacuum (2 · 10 −5 Torr) in silica tubes. The potential influence of: residual gases; adsorbed gases; gases, penetrating through tube walls; structural defects in silica and surface SiO 2 layer is discussed. It is suggested that the gases and water vapour adsorbed on the surface and surface SiO 2 layer (which has higher reactivity and adsorbing ability) are the main reasons for the observed chemical changes. The conditions of the experiments have been found so to minimize these changes.