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Identifying novel genetic determinants for oxidative stress tolerance in Candida glabrata via adaptive laboratory evolution
Author(s) -
Huang Mian,
Kao Katy C.
Publication year - 2018
Publication title -
yeast
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.923
H-Index - 102
eISSN - 1097-0061
pISSN - 0749-503X
DOI - 10.1002/yea.3352
Subject(s) - biology , candida glabrata , transcriptome , virulence , oxidative stress , phenotype , population , genetics , mutant , gene , microbiology and biotechnology , gene expression , biochemistry , candida albicans , demography , sociology
Candida glabrata ( C glabrata ) is an important yeast of industrial and medical significance. Resistance to oxidative stress is an important trait affecting its robustness as a production host or virulence as a pathogenic agent, but current understanding of resistance mechanisms is still limited in this fungus. In this study, we rapidly evolved C glabrata population to adapt to oxidative challenge (from 80mM to 350mM of H 2 O 2 ) through short‐term adaptive laboratory evolution. Adaptive mutants were isolated from evolved populations and subjected to phenotypic and omics analyses to identify potential mechanisms of tolerance to H 2 O 2 . Phenotypic characterizations revealed faster detoxification of H 2 O 2 and ability to initiate growth at a higher concentration of the oxidant in the isolated adaptive mutants compared with the wild type. Genome resequencing and genome‐wide transcriptome analysis revealed multiple genetic determinants (eg, CAGL0E01243g, CAGL0F06831g, and CAGL0C00385g) that potentially contribute to enhanced H 2 O 2 resistance. Subsequent experimental verification confirmed that CgCth2 (CAGL0E01243g) and CgMga2 (CAGL0F06831g) are important in C glabrata tolerance to oxidative stress. Transcriptome profiling of adaptive mutants and bioinformatic analysis suggest that NADPH regeneration, modulation of membrane composition, cell wall remodeling, and/or global regulatory changes are involved in C glabrata tolerance to H 2 O 2 .