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La/B 4 C small period multilayer interferential mirror for the analysis of boron
Author(s) -
André J.M.,
Jonnard P.,
Michaelsen C.,
Wiesmann J.,
Bridou F.,
Ravet M.F.,
Jérome A.,
Delmotte F.,
Filatova E. O.
Publication year - 2005
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.793
Subject(s) - boron , materials science , synchrotron radiation , optics , reflectometry , diode , wavelength , optoelectronics , analytical chemistry (journal) , chemistry , physics , nuclear physics , time domain , chromatography , computer science , computer vision
An La/B 4 C multilayer interferential mirror with small period d (4.8 nm) was produced by diode sputtering for the detection of the boron K emission by wavelength‐dispersive x‐ray spectrometry at a large Bragg angle (close to 45°). The structure of the mirror was characterized by grazing incidence x‐ray reflectometry and its performance at the energy of the boron K emission (183 eV) was evaluated by means of polarized synchrotron radiation. Spectrometric measurements showed that the La/B 4 C mirror improved the detection limit of boron using by a factor of 2 with respect to similar Mo/B 4 C mirrors and by a factor of 4 with respect to a lead stearate crystal. Copyright © 2005 John Wiley & Sons, Ltd.