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Natural water specimen preparation for TXRF analysis using a Johansson wavelength‐dispersive spectrometer
Author(s) -
Kurunczi S.,
Sakurai K.
Publication year - 2004
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.756
Subject(s) - wafer , silicon , wavelength , materials science , spectrometer , sample preparation , analytical chemistry (journal) , etching (microfabrication) , total internal reflection , optics , chemistry , nanotechnology , chromatography , optoelectronics , physics , layer (electronics)
A special method of specimen preparation is described aimed at achieving a small size of the order of 50 µm. The difficulty is especially great when preparing droplet residues from natural water on a silicon wafer as a supporting material for this experiment. We report the first promising results using an HF etching method to obtain a hydrophobic silicon surface. A specimen (residue) size of ∼ 80 µm was obtained on the modified silicon surface, making wavelength‐dispersive total reflection x‐ray fluorescence (WD‐TXRF) analysis possible for a standard reference sample of natural water (TMDA 53.2). Copyright © 2004 John Wiley & Sons, Ltd.
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