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Status and perspectives of capillary optics at a third‐generation synchrotron radiation source
Author(s) -
Vincze L.,
Riekel C.
Publication year - 2003
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.625
Subject(s) - undulator , beamline , optics , synchrotron radiation , capillary action , flux (metallurgy) , radiation , beam (structure) , beam divergence , materials science , physics , photon , laser , laser beams , beam diameter , composite material , metallurgy
Glass capillary optics has been used routinely at the ESRF microfocus beamline for several years. A large fraction of applications has been to solid polymers and biopolymers. Flux densities up to 10 8 photons s −1 µm −2 mA −1 at 13 keV have been obtained for a beam size down to 2 µm fwb (full‐width‐at‐base). By better matching the divergence from the condensing mirror system to the acceptance of the capillary and increasing the brilliance by an undulator optimized to 13 keV, the flux density is expected to increase by up to a factor of 100. A reduction of beam size to about 100 nm by maintaining current flux density levels is in principle possible. Copyright © 2003 John Wiley & Sons, Ltd.