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X‐ray diffraction effects in submicron slits and channels
Author(s) -
Ognev L. I.
Publication year - 2002
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.594
Subject(s) - diffraction , optics , collimator , attenuation , distortion (music) , thin film , radiation , amplitude , materials science , channel (broadcasting) , physics , computational physics , molecular physics , optoelectronics , telecommunications , nanotechnology , computer science , amplifier , cmos
The effects of diffraction on capture of the radiation into narrow channels between two weakly rough surfaces pressed together (‘slitless collimator’) and channeling of x‐radiation in a three‐layered structure with low atomic number thin film inside were investigated. The influence of channel shape distortion and its surface quality on the formation of the outgoing beam was investigated. A plausible explanation is given for the observed effect of abnormality of transmission through Cr/C/Cr thin‐film channels with account of periodic deformation. The calculations of the X‐ray waveguide mode attenuation in thin rough channels were compared with the results of numerical integration of the quasi‐optical equation for electrical field amplitude. Copyright © 2002 John Wiley & Sons, Ltd.