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X‐ray waveguide phenomenon in thin layers under grazing incidence conditions.
Author(s) -
Ebel Horst,
Svagera Robert,
Ebel Maria F.
Publication year - 2001
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.485
Subject(s) - refraction , optics , wafer , waveguide , beam (structure) , snell's law , thin film , total internal reflection , physics , angle of incidence (optics) , silicon , plane (geometry) , materials science , optoelectronics , geometry , mathematics , quantum mechanics
Hayashi et al. published a paper on refracted x‐rays propagating near the surface under grazing incidence conditions. For pure silicon wafers the refraction can be described by Snell's law, whereas for thin n ‐C 33 H 86 layers on silicon wafers an additional beam occurs. An interesting feature of this beam is the constant photon energy over a wide range of take‐off angles. The authors suggested that the layer acts as a waveguide and a suitable x‐ray refraction theory for thin films is required. The present investigation deals with the interpretation of the waveguide phenomenon by the concept of an interference between two plane wave fields propagating under angles ±ϕ. The experimental results of Hayashi et al. are in good agreement with our calculated values. Copyright © 2001 John Wiley & Sons, Ltd.

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