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Local structure around phosphorus atoms in nickel–phosphorus alloy films studied by total electron yield x‐ray absorption fine structure
Author(s) -
Watanabe Takashi,
Kato Jun,
Matsuo Shuji,
Wakita Hisanobu,
Umesaki Norimasa
Publication year - 2001
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.458
Subject(s) - x ray absorption fine structure , alloy , materials science , intermetallic , nickel , absorption (acoustics) , phosphorus , x ray photoelectron spectroscopy , analytical chemistry (journal) , crystal structure , yield (engineering) , crystallography , metallurgy , chemistry , chemical engineering , spectroscopy , composite material , physics , quantum mechanics , engineering , chromatography
Nickel– phosphorus alloy films, deposited on titanium by electroless NiP plating, were studied by means of total electron yield (TEY) x‐ray absorption fine structure (XAFS) and x‐ray diffraction (XRD). XAFS spectra were analyzed by the discrete variational Xα (DV‐Xα) molecular orbital method and XAFS spectral simulation using photoelectron multiple scattering theory (FEFF8), in order to clarify the deposition mechanism of Ni 3 P from NiP alloy films under various heating conditions. As for the electroless NiP plating, the quasi‐intermetallic compounds of Ni 3 P were formed under as‐deposited conditions before the heat treatment. The samples obtained after the heat treatment were in the form of larger crystal grains of Ni 3 P structure. Copyright © 2001 John Wiley & Sons, Ltd.