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Apparatus for low‐energy X‐ray fluorescence using an Al K X‐ray source and an Si(Li) detector
Author(s) -
Musket R. G.,
Holmes S. J.
Publication year - 1990
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.1300190406
Subject(s) - detector , x ray , sputtering , x ray detector , x ray fluorescence , materials science , characterization (materials science) , fluorescence , energy (signal processing) , radioactive source , optics , physics , thin film , nanotechnology , quantum mechanics
The concept, design, characterization and operation of an apparatus for low‐energy x‐ray fluorescence are described. This system utilizes commercially available components in a novel arrangement. An Al K x‐ray source, an ultra‐thin‐windowed Si(Li) detector and an ion gun for sputter cleaning were combined to perform analyses for elements with atomic number Z ⩾ 6. Pairs of slit collimators placed between the specimen and the x‐ray detector defined the area analyzed. The system configuration permitted analyses over areas with a variety of dimensions (0.4–22 mm). Distinction between surface and bulk signals was possible using the sputter‐cleaning capability.