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Absolute x‐ray fluorescence method for the determination of metal thicknesses by intensity ratio measurements
Author(s) -
Vazquez C.,
De Leyt D. V.,
Riveros J. A.
Publication year - 1990
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.1300190303
Subject(s) - materials science , substrate (aquarium) , intensity (physics) , metal , radiation , nickel , titanium , x ray fluorescence , fluorescence , radiant intensity , analytical chemistry (journal) , optics , excitation , chemistry , metallurgy , oceanography , physics , electrical engineering , engineering , chromatography , geology
An absolute method for the determination of the thickness of a metal film deposited on a metallic substrate is described. The method is based on the measurement of fluorescent intensity ratios for two lines from the substrate element. Titanium sheets covered with nickel layers of different thicknesses (between 3 and 22 μm) were employed to test the method. Intensity measurements were performed using different excitation modes and detection systems. Additionally, the proposed method can be employed to determine the density of the deposited material or the incident angle of primary radiation and take‐off angle if the deposited metal film thickness is known. The method can be applied by using the intensity ratios of two lines generated through electron vacancies in the same shell.