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Monte carlo simulation of thin‐film X‐ray microanalysis at high energies
Author(s) -
Rosa R.,
Armigliato A.
Publication year - 1989
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.1300180106
Subject(s) - monte carlo method , microanalysis , computational physics , electron , energy (signal processing) , code (set theory) , optics , materials science , computer science , physics , nuclear physics , chemistry , statistics , mathematics , organic chemistry , set (abstract data type) , quantum mechanics , programming language
A Monte Carlo code previously used in modelling x‐ray emission by incident electrons of several tens of kilo‐electronvolts has been extended up to 300 keV, which is typical of the present medium‐energy transmission electron microscopes. With the aid of a further numerical code, both the thickness and composition of thin self‐supporting films can be simultaneously determined. This code exploits the bootstrap statistical method, which provides a realistic error analysis of the final results from the precision of the experimental data. The potential of the two codes is illustrated through a simulated example of a single self‐supporting film. Such calculations can also be applied to two or more overlying films transparent to an electron beam.