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Determination of some trace elements in high‐purity tantalum metal by thin‐film x‐ray fluorescence spectrometry
Author(s) -
Eddy B. T.,
Balaes A. M. E.
Publication year - 1988
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.1300170508
Subject(s) - tantalum , niobium , x ray fluorescence , materials science , analytical chemistry (journal) , tungsten , detection limit , thin film , mass spectrometry , molybdenum , coprecipitation , titanium , chemistry , fluorescence , inorganic chemistry , metallurgy , chromatography , physics , quantum mechanics , nanotechnology
The determination of niobium, molybdenum, tungsten, iron and titanium in tantalum metal is described. After dissolution of the metal and extraction of the tantalum by a chromatographic method using tributyl phosphate, the trace elements are determined on thin‐film samples by x‐ray fluorescence spectrometry. The thin‐film samples are prepared either by spotting the sample solutions directly on to filter‐paper or by coprecipitation with indium. The limits of detection on the thin film are 0.05–0.7 μg, depending on the element being measured.