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Depth profiling of brass by means of PIXE
Author(s) -
Rössiger V.,
Lenk M.
Publication year - 1985
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.1300140206
Subject(s) - brass , materials science , profiling (computer programming) , analytical chemistry (journal) , metallurgy , atomic physics , copper , physics , chemistry , environmental chemistry , computer science , operating system
The PIXE (particle‐induced x‐ray emission) depth profiling technique was applied to brass coatings on steel wire. Applying protons with energies E 0 = 100–360 keV from a small electrostatic accelerator, the surface region to a depth of up to about 1 μm can be investigated. Three, or at maximum four, parameters of a suitable model function for the concentration profile were evaluated by analysing the ratio of Cu Kα and Zn Kα experimental x‐ray yields as a function of the primary energy of the particles.