Depth profiling of brass by means of PIXE | Zendy

Rössiger V. | Zendy; Lenk M. | Zendy

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Depth profiling of brass by means of PIXE

Author(s) -

Rössiger V.,

Lenk M.

Publication year - 1985

Publication title -

x‐ray spectrometry

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.447

H-Index - 45

eISSN - 1097-4539

pISSN - 0049-8246

DOI - 10.1002/xrs.1300140206

Subject(s) - brass , materials science , profiling (computer programming) , analytical chemistry (journal) , metallurgy , atomic physics , copper , physics , chemistry , environmental chemistry , computer science , operating system

The PIXE (particle‐induced x‐ray emission) depth profiling technique was applied to brass coatings on steel wire. Applying protons with energies E 0 = 100–360 keV from a small electrostatic accelerator, the surface region to a depth of up to about 1 μm can be investigated. Three, or at maximum four, parameters of a suitable model function for the concentration profile were evaluated by analysing the ratio of Cu Kα and Zn Kα experimental x‐ray yields as a function of the primary energy of the particles.

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