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Surface density measurement of pure element thin films by radioisotope x‐ray fluorescence spectroscopy
Author(s) -
Saleh N. S.,
Hallak A. B.
Publication year - 1983
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.1300120409
Subject(s) - materials science , fluorescence , spectroscopy , scattering , radiation , fluorescence spectroscopy , thin film , optics , surface (topology) , analytical chemistry (journal) , intensity (physics) , x ray , chemistry , physics , nanotechnology , geometry , mathematics , chromatography , quantum mechanics
A method for measuring the surface density of pure element thin films using x‐ray fluorescence and coherent scattering of primary radiation has been developed. The accuracy is greatly improved by intensity ratio measurements where the dependence on the accuracy of the fundamental parameters is eliminated.