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Determination of composition and thickness of TiN x O y films on silicon by combined x‐ray and nuclear microanalysis
Author(s) -
Armigliato A.,
Garulli A.,
Rosa R.,
Berti M.,
Drigo A. V.,
Desalvo A.
Publication year - 1983
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.1300120109
Subject(s) - electron microprobe , microprobe , microanalysis , tin , electron probe microanalysis , silicon , stoichiometry , analytical chemistry (journal) , chemical composition , materials science , chemistry , mineralogy , metallurgy , organic chemistry , chromatography
The stoichiometry and thickness of TiN x O y films has been determined by electron microprobe and nuclear microanalysis. The difficulty arising in the electron microprobe from the interference between NKα and TiLI lines has been overcome by using a suitable Monte Carlo computing scheme. This procedure takes into account the SiKα intensity which was found to be sensitive to composition and thickness of the overlying TiN x O y film. The good agreement between electron microprobe and nuclear microanalysis results indicate the validity of the method.