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Mass thickness measurement of pure element films by X‐ray fluorescence spectroscopy
Author(s) -
Laguitton Daniel
Publication year - 1977
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.1300060406
Subject(s) - calibration , materials science , range (aeronautics) , optics , calibration curve , analytical chemistry (journal) , table (database) , interferometry , spectroscopy , thin film , composite material , chemistry , computer science , nanotechnology , physics , detection limit , chromatography , quantum mechanics , data mining
A precise and rapid method of measuring the mass thickness of pure element films using the LAMA Program to generate calibration curves by the fundamental parameters method is described. Only thick (‘bulk’) pure element standards are required thereby eliminating the necessity of preparing thin film standards. The accuracy is comparable to routine interferometry. A table giving the intensity ratios of the thin film to the corresponding thick standard is given for eighteen common elements and a thickness range of 500–100 000 Å, making it possible to apply the method without use of a computer.