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Scattered primary radiation as an internal standard in X‐ray emission spectrometry: Use in the analysis of copper metallurgical products
Author(s) -
Clark N. H.,
Mitchell R. J.
Publication year - 1973
Publication title -
x‐ray spectrometry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.447
H-Index - 45
eISSN - 1097-4539
pISSN - 0049-8246
DOI - 10.1002/xrs.1300020203
Subject(s) - copper , wavelength , radiation , silicon , materials science , calibration , absorption (acoustics) , x ray , analyte , optics , analytical chemistry (journal) , metallurgy , optoelectronics , chemistry , physics , composite material , chromatography , quantum mechanics
The use of scattered primary X‐radiation of various wavelengths in the range 0.250 to 1.999 Å has been studied in the analysis of copper, iron, and silicon (as silica) in copper metallurgical products. In the analysis of copper and iron, the use of relatively short wavelength predominantly incoherently‐scattered radiation is superior to the use of background radiation near the analyte emission line, and it is necessary for the scatter wavelength to be shorter than that of a major absorption edge of a major element in the system. The wavelength 0.889 Å is suggested as the optimum for use in the analysis of copper, and one simple calibration equation provides acceptable analysis over the whole range of C Cu from 0 to 42%. Over short ranges wavelengths from 0.362 to 0.889 Å are useful in the analysis of iron; but one single calibration cannot be devised to cover the whole range of C Fe from 0 to 56%. The limited results for silicon as silica are included for completeness.