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Monte Carlo simulation of a control for cathodic sputtering
Author(s) -
Mohnke Andreas
Publication year - 1991
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.2230030311
Subject(s) - monte carlo method , sputtering , power (physics) , substrate (aquarium) , deposition (geology) , set (abstract data type) , gas pressure , control theory (sociology) , electrical engineering , materials science , engineering , control (management) , physics , computer science , mathematics , thin film , thermodynamics , statistics , nanotechnology , paleontology , oceanography , artificial intelligence , sediment , geology , biology , petroleum engineering , programming language
Subject is a set‐up for gas pressure and discharge power regulation of a cathodic sputtering plant. It comprises two film thickness monitors and a control unit. The film thickness monitors measure the deposition rate at target and substrate level. By means of a computer the control unit calculates a quotient from the monitor data and compares it with a set value. Any change in gas pressure or discharge power leads to a deviation of the quotient from the set value. The control unit eliminates the deviation by a regulation of gas pressure or discharge power. The Monte Carlo method makes it possible to calculate the pressure dependence of the set‐sup. It was not possible to determine a relationship between discharge power and the output signal of the control unit by the used theoretical model.