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Die Hochleistungsmikrowellenquelle Miro
Author(s) -
Nauenburg KlausDieter
Publication year - 2019
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201900725
Subject(s) - plasma enhanced chemical vapor deposition , sputtering , materials science , plasma , high power impulse magnetron sputtering , microwave , coating , deposition (geology) , sputter deposition , optoelectronics , analytical chemistry (journal) , chemical vapor deposition , nanotechnology , thin film , chemistry , computer science , physics , environmental chemistry , telecommunications , quantum mechanics , paleontology , sediment , biology
Summary The high‐performance microwave source Miro – Plasma characterization and applications in PECVD and combination sputtering processes To evaluate the potential of the high‐efficiency microwave source Miro 200 CI the properties of plasma processes were investigated focusing at PECVD coatings of a‐C:H‐ and SiO x as relevant applications. The sources were also intensively characterized by plasma diagnostic methods, e.g. by optical emission spectroscopy and electrical plasma probes. The analysis of the real efficiency of individual sources with slight changes in construction could be used to come to an optimized design. The Miro sources are able to create an extensive working volume showing relative homogeneous deposition rates of currently 35μm/h for a‐C:H and 25 μm/h for SiO x . An arrangement of multiple sources enables PECVD processes for large area coating at a pressure level close to those commonly used with PVD sources. So, post‐oxidation of sputtered layers with the Miro source could be used beneficially to obtain optical oxide layers with lower absorption. Combinations with HIPIMS sputter sources lead to efficient deposition processes of coatings for tribological applications.