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Plasmatechnik 4.0
Author(s) -
Ferse Katrin,
Awakowicz Peter,
Beck Uwe,
Brand Carola,
Engelstädter Jan Peter,
Fiedler Wilfriede,
Foest Rüdiger,
Kersten Holger,
Lemmer Oliver,
Schäfer Hans-Jürgen,
Schwock Alexander
Publication year - 2018
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201800697
Subject(s) - standardization , process (computing) , state (computer science) , engineering , interface (matter) , computer science , engineering management , pulmonary surfactant , gibbs isotherm , algorithm , chemical engineering , operating system
Summary Plasma Technology 4.0 – State of the art, developments and expectations New technologies offer great opportunities for plasma applications. This fact is also known by the players in surface technology who deal intensively with these current topics. In everyday practice there are already good examples of integrable IoT services for process technology right through to networked business processes. The expectations are high and the concerns as well. Beginning with social aspects of the man‐machine interface through standardization to cyber security there are numerous topics that are discussed in the community. The potential of the plasma technology drives the stakeholders and inspires to more and more new research projects for intelligent process diagnostics and process control.