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Novel coatings for unique applications
Author(s) -
Nielsen Lars Pleth
Publication year - 2018
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201800690
Subject(s) - high power impulse magnetron sputtering , materials science , sputtering , coating , sputter deposition , amorphous solid , pulsed dc , cavity magnetron , residual stress , optoelectronics , metallurgy , composite material , thin film , nanotechnology , chemistry , crystallography
Summary In the present article three different coatings systems are discussed based on reactive and non‐reactive sputtering processes utilizing HiPIMS, pulsed DC and DC magnetron sputtering. The HiPIMS platform was used to develop a very hard TiB 2 coating with a low residual stress level. Pulsed DC magnetron sputtering was used to deposit 50 μm thick amorphous Al 2 O 3 coating. Finally DC magnetron sputtering was used to deposit a Sr‐Ti‐O coating capable of releasing Sr facilitating accelerated bone formation and implant ingrowth.