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Focussed Ion Beam
Author(s) -
Petersen Jan
Publication year - 2018
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201800670
Subject(s) - polishing , nanometre , ion beam , focused ion beam , beam (structure) , enhanced data rates for gsm evolution , materials science , sputtering , field (mathematics) , ion beam analysis , ion , nanotechnology , optics , computer science , physics , thin film , artificial intelligence , composite material , mathematics , pure mathematics , quantum mechanics
Summary Focussed Ion Beam ‐“Cutting Edge” Technology of Material Analysis With the focussed ion beam technique it is possible to sputter almost any material with nanometer scale accuracy and directly image or chemically analyze structures below the surface. The major advantage towards conventional cross‐section polishing is the high precision which allows to investigate even the smallest local defects. Applications of the focused ion beam even extend to the generation of complex nano structures. This article describes the operational modes, limits and constraints of the method and gives application examples from the field of material analytics.