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Combinatorial Magnetron Sputtering
Author(s) -
Gaines J. R.
Publication year - 2017
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201700660
Subject(s) - wafer , sputter deposition , substrate (aquarium) , deposition (geology) , materials science , cathode , fabrication , sputtering , thin film , nanotechnology , electrical engineering , engineering , medicine , paleontology , oceanography , alternative medicine , pathology , sediment , geology , biology
Summary Combinatorial Magnetron Sputtering is a process where large numbers of chemically distinct thin film samples can be made in a single deposition. Utilizing a multiple cathode sputter system manufactured by the Kurt J. Lesker Company, researchers at the California Institute of Technology have developed a process which enables them to make 5,000 unique compositions on one 4″ wafer in one deposition. Compositional control is achieved by varying the tilt angle of the cathodes and Z‐distance relative to the substrate. In addition to this extraordinary fabrication capability, the group also developed a model which can predict the range of future compositions as well as a rapid characterization technique which can sort through thousands of compositions in a 24 hour period.