Premium
High precision optical filter based on magnetron sputtering
Author(s) -
Biethan JensPeter,
Arhilger Detlef,
Pistner Jürgen,
Reus Holger,
Stapp Martin,
Hagedorn Harro
Publication year - 2017
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201700654
Subject(s) - materials science , sputtering , filter (signal processing) , engineering , electrical engineering , nanotechnology , thin film
Summary Current and upcoming specifications for optical filters and components are driving the demand for optimized deposition techniques. Besides the need for high precision process control to achieve accurate and reproducible layer properties, additional requirements from a process automation perspective have to be considered. In particular, applications in the semiconductor industry require reliable, accurate substrate handling to microelectronic standards. The Helios 800 sputtering system provides extremely accurate layer depositon and thickness control, allowing manufacture of state of the art optical components with high throughput. These include beamsplitters, band pass, edge, and multinotch dielectric filters. In addition optoelectronic applications, which combine electronic components with optical filters, are growing rapidly.