Premium
Optical spectrometry in the diagnosis of ion‐plasma processes
Author(s) -
Kostrin D. K.,
Uhov A. A.,
Lisenkov A. A.
Publication year - 2016
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201600608
Subject(s) - plasma , ion , sputtering , refractive index , interferometry , mass spectrometry , sputter deposition , analytical chemistry (journal) , chemistry , materials science , optoelectronics , optics , nanotechnology , thin film , physics , chromatography , organic chemistry , quantum mechanics
At the present stage of progress the development of ion‐plasma technological devices requires the use of express analysis of the generated plasma flux composition. Spectrometric equipment which can be embedded into the technological process to determine the composition of the gas mixture and to analyze the emission spectra of low temperature plasma generated by magnetron sputtering systems and vacuum arc sources is presented. The method of spectral interferometry that allows to control thickness and refractive index of the deposited films with depth from fractions to hundreds of micrometers is described.