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Inverted Cylindrical Magnetron Sputtering
Author(s) -
Glocker David,
Romach Mark,
Scherer George,
Eichenberger Justin,
Lanzafame John
Publication year - 2014
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201400558
Subject(s) - planar , cathode , materials science , optics , wavelength , sputtering , ion , coating , dispersion (optics) , deposition (geology) , sputter deposition , cavity magnetron , optoelectronics , chemistry , thin film , composite material , nanotechnology , physics , paleontology , computer graphics (images) , organic chemistry , sediment , computer science , biology
The shape of inverted cylindrical magnetrons makes them ideal for coating a variety of optical components having non‐planar geometries such as prisms, gratings and spherical lenses. In addition, combining dual cathode mid frequency unbalanced magnetron sputtering with the cylindrical geometry produces a unique source for ion enhanced deposition on planar substrates located at the ends of the cathode. Using a 330 mm diameter source, thickness uniformity on stationary substrates of ± 0.25 % over a diameter of 160 mm and ± 1.3 % over 200 mm can be achieved. SiO 2 and Ta 2 O 5 deposited on Si have indices of refraction at a wavelength 632 nm of 1.47 and 2.13 respectively and dispersion similar to those reported for ion assisted processes. The off‐axis nature of this arrangement makes such sources particularly useful where the acceleration of negative ions produced at the target surface can damage sensitive materials such as OLEDs.