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A vacuum arc plasma source with extended design
Author(s) -
Lisenkov A. A.,
Bystrov Yu. A.,
Vetrov N. Z.
Publication year - 2013
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201300530
Subject(s) - cathode , arc (geometry) , plasma , vacuum arc , plasma arc welding , electric arc , cold cathode , materials science , atomic physics , chemistry , optoelectronics , electrode , electrical engineering , mechanical engineering , engineering , physics , quantum mechanics
A vacuum‐arc plasma source having an extended design, operating in pulse regime and generating directed conveyer‐type flow was created and investigated. The identified regularity of development of arc discharge allowed controlling generation modes of the plasma source, providing the secure fixation of the cathode spots on the working surface and accelerated conversion of the cathode in the working mode. In this case each stage of development of arc discharge is determined by the conditions of existence of the cathode spots on the working surface of the cathode.