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Higher Tool Productivity due to New Generation of PVD Coatings
Author(s) -
Eerden Michiel,
Papa Frank,
Krug Thomas,
Driesenaar Désirée
Publication year - 2012
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201200478
Subject(s) - materials science , high power impulse magnetron sputtering , coating , residual stress , physical vapor deposition , metallurgy , sputter deposition , machining , deposition (geology) , sputtering , nanotechnology , thin film , paleontology , sediment , biology
PVD coating technology has seen many new developments in the past few years. HIPIMS + is an example of these developments with excellent results on tool productivity and lifespan. The technology combines the advantages of arc evaporation with those of magnetron sputtering and results in a dense and defect‐free coating with tuneable residual stress. The coatings have been tested successfully by international tool manufacturers. Additional developments can be seen in DLC coatings and the hydrogen‐free variety ta‐C. These coatings are suitable for low temperature deposition and machining of special materials.