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Plasma und Dünne Schichten
Author(s) -
Bewig Lars,
Kromer Jens
Publication year - 2010
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.201000432
Subject(s) - color rendering index , halogen lamp , dichroic glass , dichroic filter , rendering (computer graphics) , thin film , materials science , optics , plasma , coating , aluminium , optoelectronics , color filter array , nanotechnology , color gel , computer graphics (images) , computer science , physics , light emitting diode , wavelength , composite material , layer (electronics) , quantum mechanics , thin film transistor
Plasma and thin films for lighting application Thin films play an important role in the lighting industry. Well known products are reflectors with simple aluminium coating or with dichroic coatings for cold light mirrors. Especially for energy saving applications special halogen bulbs are coated with a transparent hot mirror that increases the overall efficiency up to 50 % while keeping the positive properties of halogen lighting like color, color rendering index, start up performance and others unchanged. Special thin film applications realize color filters, IR filters, UV filters or color conversion filters. All these processes are vacuum processes that work with plasma assistance. The most prominent technologies for cost effective production are the PICVD processes (former development of SCHOTT AG in cooperation with Auer Lighting) and the Microdyn® technology from DSI, Santa Rosa.