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Leistungsfähige Dünnschicht‐Beschichtung für die Photovoltaik
Author(s) -
Paul Dietmar
Publication year - 2009
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.200900404
Subject(s) - materials science , photovoltaics , coating , optoelectronics , photovoltaic system , sputtering , die (integrated circuit) , thin film , solar cell , silicon , nanotechnology , electrical engineering , engineering
High‐performance thin‐film coating for photovoltaic applications The thin‐film photovoltaics market is large and is expected to grow continuously. Due to its huge potential regarding cost reduction and cell efficiency improvement, sputter‐etched ZnO:Al‐based TCO can make a sustainable contribution to achieve grid parity. One of the most promising approaches here is the large scale volume manufacturing of sputter‐etched TCO glass for thin film silicon solar cells. VON ARDENNE's leading process knowhow, applied to the highly productive and reliable PIA|nova coating system, allows for cost effective production and flexible adaptation of customer specific TCO requirements.