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Zylindrische Magnetron Sputter Technologie für Architekturglasbeschichtung und Web Coating
Author(s) -
Blondeel Anja,
Persoone Peter,
De Bosscher Wilmert
Publication year - 2009
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.200900384
Subject(s) - coating , sputter deposition , materials science , sputtering , deposition (geology) , cavity magnetron , layer (electronics) , throughput , optoelectronics , engineering physics , composite material , thin film , computer science , nanotechnology , engineering , telecommunications , geology , wireless , sediment , paleontology
Over the last few decades, magnetron sputtering has become a major coating technology for depositing high quality thin films. The ease of scalability, while maintaining excellent control of all crucial layer parameters, made it appropriate for large area substrates and high mass productivity. The introduction of the rotating cylindrical magnetron concept in the nineties has further contributed to the success of sputtering in large area coating of rigid and flexible substrates. The rotatable sputtering technology does not only contribute significantly to a reduction in cost‐of‐ownership (higher target material consumption, more system throughput and up‐time …), it opens new perspectives in advanced coating applications where tolerances are narrow and requirements are high. In this paper, we will discuss the advantages of using rotatable target technology in large area coaters, whereby we will focus on the issues related to the sputter deposition on rigid and flexible substrates.