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Electron Beam Bias for Thin Capacitor Web Coating
Author(s) -
Küper Stephan,
Hagemann Heiko
Publication year - 2007
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.200700333
Subject(s) - coating , biasing , capacitor , cathode ray , materials science , beam (structure) , electron , thin film , voltage , optoelectronics , work (physics) , quality (philosophy) , optics , electrical engineering , composite material , physics , nanotechnology , engineering , nuclear physics , quantum mechanics , thermodynamics
Electron beam induced bias was applied for high speed, high quality coating of ultra thin capacitor web. Electron beam charging applies a static charge to the film and allows higher bias voltages than conventional bias systems. Using a numerical calculation of the electrical and thermal forces at work it can be shown that electron beam bias results in better cooling and lower peak temperatures of the film. The advantages for the film coating process are higher possible coating speeds and/or better film quality. Further, the effect of pinholes during coating is much reduced.