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A new generation of getter‐coated sputter ion pumps for XHV applications
Author(s) -
Mura M.,
Paolini C.
Publication year - 2007
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.200700323
Subject(s) - getter , overlayer , sputtering , hydrogen , ion pump , carbon monoxide , materials science , sputter deposition , ion , metallurgy , chemistry , optoelectronics , thin film , nanotechnology , biochemistry , organic chemistry , catalysis
A new concept of sputtered ion getter pump is presented. The body of this pump is internally coated by a getter thin film constituted by a layer of TiZrV together with a protective covering of palladium, according to a technology that CERN (European Center for Nuclear Research) licensed us. TiZrV is a well‐known alloy able to pump getterable gases such as hydrogen, oxygen, nitrogen, carbon monoxide and dioxide. With the exception of H 2 , the sorption of these gases is not reversible and it causes a progressive contamination of the bulk of the material. With the addition of the palladium overlayer, the pumping action is limited to hydrogen and carbon monoxide, but the lifetime of the film is strongly enhanced, thanks to the possibility of an unlimited number of thermal activations, which restore the initial performances of the film. An innovative sputter ion pump design, optimized for both pumping speed in ultra high vacuum and getter film sputtering, will be introduced. Moreover, pumping speed measurements and ultimate pressure data, obtained after a relatively short bake‐out at temperature lower than standard procedures, will be reported.