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Ion Sources for Vacuum Thin Film Technology
Author(s) -
Reuschling Ralf,
Schultheiss Eberhard
Publication year - 2006
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.200690031
Subject(s) - ion , materials science , optoelectronics , thin film , engineering physics , nanotechnology , engineering , chemistry , organic chemistry
Ion sources are used in vacuum thin film technology in various types and for numerous applications. This article provides an overview of basic features of ion sources and of the present status of ion source technology. This includes an explanation of the main parameters of such sources, typical set‐up and applications, as well as power supply components.