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Verwendung kalter Plasmen in Schichtherstellungsprozessen
Author(s) -
Pulker Hans K.
Publication year - 1995
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.19950070104
Subject(s) - materials science , plasma , coating , structuring , deposition (geology) , nanotechnology , engineering physics , engineering , physics , nuclear physics , geology , paleontology , finance , sediment , economics
Abstract Plasma deposition techniques are strongly required in high‐quality thin film production. In this paper an attempt is made to describe shortly fundamental properties of cold plasmas and to inform about their technical generation. The growing industrial applications of plasma in various PVD‐ and CVD‐technologies for coating and for surface cleaning as well as for chem. modification and structuring of surfaces and films are reviewed. Finally an example is given about plasma surface treatment of plastic car bumpers before lacquering.