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Teilchenstrahlinduzierte Prozesse an dielektrischen Oberflächen
Author(s) -
Rupertus V.,
Rothhaar U.,
Köpfer P.,
Lorenz A.,
Oechsner H.
Publication year - 1993
Publication title -
vakuum in forschung und praxis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.213
H-Index - 13
eISSN - 1522-2454
pISSN - 0947-076X
DOI - 10.1002/vipr.19930050310
Subject(s) - stoichiometry , characterization (materials science) , cathode ray , analytical chemistry (journal) , materials science , dielectric , electron , chemistry , optoelectronics , nanotechnology , physics , nuclear physics , chromatography
The possibilities for surface and depth profile analysis of dielectric samples with partially modified electron and mass spectrometric methods are described. The respective techniques have been employed for the quantitative characterization of electron and ion beam induced stoichiometry effects at glass surfaces.