Measurements of nitrogen atom density in a microwave‐excited plasma jet produced under moderate pressures | Zendy

Kim Jaeho | Zendy; Takeda Keigo | Zendy; Itagaki Hirotomo | Zendy; Wang Xuelun | Zendy; Hirose Shingo | Zendy; Ogiso Hisato | Zendy; Shimizu Tetsuji | Zendy; Kumagai Naoto | Zendy; Tsutsumi Takayoshi | Zendy; Kondo Hiroki | Zendy; Hori Masaru | Zendy; Sakakita Hajime | Zendy

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Measurements of nitrogen atom density in a microwave‐excited plasma jet produced under moderate pressures

Author(s) -

Kim Jaeho,

Takeda Keigo,

Itagaki Hirotomo,

Wang Xuelun,

Hirose Shingo,

Ogiso Hisato,

Shimizu Tetsuji,

Kumagai Naoto,

Tsutsumi Takayoshi,

Kondo Hiroki,

Hori Masaru,

Sakakita Hajime

Publication year - 2020

Publication title -

ieej transactions on electrical and electronic engineering

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.254

H-Index - 30

eISSN - 1931-4981

pISSN - 1931-4973

DOI - 10.1002/tee.23194

Subject(s) - plasma , excited state , microwave , atomic physics , jet (fluid) , ion source , nitrogen , materials science , absorption (acoustics) , atom (system on chip) , chemistry , physics , organic chemistry , quantum mechanics , embedded system , computer science , composite material , thermodynamics

Using a microwave‐excited plasma source based on a microstrip line, we have generated a nitrogen plasma jet at a moderate pressure in the range from 1 to 10 kPa. The densities of nitrogen (N) atoms produced by the plasma jet were measured with a vacuum ultraviolet absorption spectroscopy. The results show that the plasma jet is able to provide a high density of N atoms at least 4.5 × 10 14 cm −3 at 1.5 kPa. The N atom densities vary widely with the change in gas flow rate and substrate placement. We expect that this plasma source will provide a high performance as an advanced N radical source in various applications. © 2020 Institute of Electrical Engineers of Japan. Published by Wiley Periodicals LLC.

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