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Measurements of nitrogen atom density in a microwave‐excited plasma jet produced under moderate pressures
Author(s) -
Kim Jaeho,
Takeda Keigo,
Itagaki Hirotomo,
Wang Xuelun,
Hirose Shingo,
Ogiso Hisato,
Shimizu Tetsuji,
Kumagai Naoto,
Tsutsumi Takayoshi,
Kondo Hiroki,
Hori Masaru,
Sakakita Hajime
Publication year - 2020
Publication title -
ieej transactions on electrical and electronic engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.254
H-Index - 30
eISSN - 1931-4981
pISSN - 1931-4973
DOI - 10.1002/tee.23194
Subject(s) - plasma , excited state , microwave , atomic physics , jet (fluid) , ion source , nitrogen , materials science , absorption (acoustics) , atom (system on chip) , chemistry , physics , organic chemistry , quantum mechanics , embedded system , computer science , composite material , thermodynamics
Using a microwave‐excited plasma source based on a microstrip line, we have generated a nitrogen plasma jet at a moderate pressure in the range from 1 to 10 kPa. The densities of nitrogen (N) atoms produced by the plasma jet were measured with a vacuum ultraviolet absorption spectroscopy. The results show that the plasma jet is able to provide a high density of N atoms at least 4.5 × 10 14 cm −3 at 1.5 kPa. The N atom densities vary widely with the change in gas flow rate and substrate placement. We expect that this plasma source will provide a high performance as an advanced N radical source in various applications. © 2020 Institute of Electrical Engineers of Japan. Published by Wiley Periodicals LLC.