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Lithographic micropatterning on the β‐PVDF film using reactive ion etching aim for high‐resolution skin sensors
Author(s) -
Miki Hirofumi,
Sugii Ryota,
Kawabata Yutoku,
Tsuchitani Shigeki
Publication year - 2019
Publication title -
ieej transactions on electrical and electronic engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.254
H-Index - 30
eISSN - 1931-4981
pISSN - 1931-4973
DOI - 10.1002/tee.22978
Subject(s) - reactive ion etching , cleanroom , materials science , micropatterning , etching (microfabrication) , lithography , photolithography , nanotechnology , polyvinylidene fluoride , dry etching , piezoelectricity , optoelectronics , analytical chemistry (journal) , composite material , chemistry , chromatography , polymer , layer (electronics)
We report a method for high‐fidelity lithographic patterning of the flexible β‐phase polyvinylidene difluoride (PVDF) film using traditional cleanroom equipment and commercially available materials. In our process, the chemically reactive gas of CHF 3 , CF 4 and SF 6 was used as a simple substance mixed with O 2 . The effects of process parameters on the PVDF dry etching characteristics were investigated by controlling that of Radio frequency (RF) power, process pressure, gas type and the mixed concentration in O 2 as well as its mass flow rate. At a constant RF power (100 W) and associated process conditions, 40–70 µm of fine‐line patterns and several tens µm/h of high etch rate could be realized on a 110 µm‐thick β‐PVDF film without much loss of its piezoelectricity. © 2019 Institute of Electrical Engineers of Japan. Published by John Wiley & Sons, Inc.