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Basic characteristics of Ar/N 2 atmospheric pressure nonequilibrium microwave discharge plasma jets
Author(s) -
Yuji Toshifumi,
Fujioka Kazunari,
Fujii Shuitsu,
Akatsuka Hiroshi
Publication year - 2007
Publication title -
ieej transactions on electrical and electronic engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.254
H-Index - 30
eISSN - 1931-4981
pISSN - 1931-4973
DOI - 10.1002/tee.20193
Subject(s) - plasma , coaxial , atmospheric pressure , microwave , rotational temperature , atomic physics , vibrational temperature , excited state , plasma cleaning , non equilibrium thermodynamics , materials science , atmospheric pressure plasma , chemistry , analytical chemistry (journal) , physics , thermodynamics , electrical engineering , molecule , organic chemistry , quantum mechanics , chromatography , meteorology , engineering
To understand the mechanism of surface processing by atmospheric pressure nonequilibrium microwave discharge plasma jets of coaxial type without a resonator, we measured the vibrational and rotational temperatures in plasmas using optical emission spectroscopy. The plasma was excited by a microwave power supply, using a gas mixture of Ar and N 2 as the plasma gas, and changing the flow rate of N 2 gas. We also measured the change in the contact angle of a PET film before and after the plasma processing. It decreased as the plasma rotational temperature increased, indicating that the hydrophilicity of the PET surface was improved as the plasma rotational temperature became higher. © 2007 Institute of Electrical Engineers of Japan. Published by John Wiley & Sons, Inc.