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Electron‐beam‐pumped light sources using graphite nanoneedle field emitters and Si electron‐transparent films
Author(s) -
Mimura Hidenori,
Shiozawa Kazufumi,
Neo Yoichiro,
Okada Morihiro,
Takahasi Masafumi,
Hashiguchi Gen
Publication year - 2007
Publication title -
ieej transactions on electrical and electronic engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.254
H-Index - 30
eISSN - 1931-4981
pISSN - 1931-4973
DOI - 10.1002/tee.20141
Subject(s) - nanoneedle , cathode ray , field electron emission , materials science , electron , optoelectronics , sputtering , electron gun , electron beam physical vapor deposition , nanotechnology , physics , chemical vapor deposition , thin film , nanostructure , quantum mechanics
Sputter‐induced carbon nanoneedle field emitters and Si electron‐transparent films have been developed for electron‐beam‐pumped light sources. The sputter‐induced carbon nanoneedle field emitters exhibited a stable electron emission of 0.1 mA at an average field of 13 V/µm. The 1.5‐µm thick Si electron‐transparent films achieved an electron transmittance of about 60% at an acceleration voltage of 27 kV. An electron‐beam‐pumped light source was demonstrated from the excitation of N 2 gas, and a N 2 gas spectrum was clearly observed. The increase of the beam current is important for increasing the light intensity. Copyright © 2007 Institute of Electrical Engineers of Japan© 2007 Institute of Electrical Engineers of Japan. Published by John Wiley & Sons, Inc.
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