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Current status of microplasma research
Author(s) -
Tachibana Kunihide
Publication year - 2006
Publication title -
ieej transactions on electrical and electronic engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.254
H-Index - 30
eISSN - 1931-4981
pISSN - 1931-4973
DOI - 10.1002/tee.20031
Subject(s) - microplasma , microscale chemistry , plasma , materials science , nanotechnology , atmospheric pressure , current (fluid) , engineering physics , optoelectronics , electrical engineering , engineering , physics , mathematics education , mathematics , quantum mechanics , meteorology
Microscale plasmas of micrometer to millimeter range have been attracting much attention in recent years. Those microplasmas generally operate at high‐pressure regions, including atmospheric pressure, and exhibit characteristics that differ from traditional plasmas at lower pressure regions in their plasma parameters and other parameters originating from their small dimensions. When those characteristics are well combined with the inherent properties of plasmas as reactive, light‐emissive and conductive/dielectric media, there appear a variety of potential applications for nano‐material syntheses, micromachining tools, microchemical analyses, photonic devices and biomaterial processing. In this article, the current status and perspective of microplasma research are reviewed from the viewpoints of plasma generation, diagnostics/simulations and new applications. © 2006 Institute of Electrical Engineers of Japan. Published by John Wiley & Sons, Inc.