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In situ TREXS Observation of Surface Reduction Reaction of NiO Film with ∼2 nm Surface Sensitivity
Author(s) -
Abe Hitoshi,
Niwa Yasuhiro,
Takeichi Yasuo,
Kimura Masao
Publication year - 2019
Publication title -
the chemical record
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.61
H-Index - 78
eISSN - 1528-0691
pISSN - 1527-8999
DOI - 10.1002/tcr.201800197
Subject(s) - x ray absorption fine structure , synchrotron radiation , spectroscopy , non blocking i/o , materials science , synchrotron , x ray photoelectron spectroscopy , analytical chemistry (journal) , absorption spectroscopy , surface (topology) , absorption (acoustics) , chemistry , optics , nuclear magnetic resonance , physics , catalysis , geometry , mathematics , quantum mechanics , composite material , biochemistry , chromatography
X‐ray absorption fine structure (XAFS) spectroscopy is one of the most widely used methods at synchrotron radiation facilities. XAFS gives us information on chemical states and local structures. Fundamentally, XAFS is bulk sensitive, not surface sensitive. If a surface sensitive XAFS method was available, surface chemical reactions can be observed under realistic conditions. Here, we report the development and present status of a type of surface sensitive x‐ray spectroscopy, which is named total reflection x‐ray spectroscopy, TREXS.